Two new open-access journals will join the distinguished ranks of publications produced by the American Institute of Physics (AIP) later this year. The journals – JAP Materials and APL Materials – will be affiliated with AIP’s two premier applied physics journals, Journal of Applied Physics (JAP) and Applied Physics Letters (APL), and will feature research on materials, their functions, and their potential applications.

“Materials science is an important and growing area of research that touches many disciplines,” says John Haynes, vice president of publishing at AIP. “Establishing these affiliated journals will allow us to extend the brands of two of the field’s most cited and respected publications into the related and growing area of materials science.”

As with the parent journals, articles will undergo a thorough peer review process overseen by an editor and an international team of associate editors. Likewise, the journals will emulate their parent publications in scope:

  • JAP Materials will provide in-depth coverage on the full breadth of research related to materials science, with a focus on significant new theoretical and experimental discoveries.
  • APL Materials will feature original research on significant topical issues within the field of materials science, but as a Letters journal it will also emphasize the timeliness of this research.

Both journals will be open access, which means that they will be freely available to the global research community. Authors will retain copyright under a Creative Commons license.

“There has been huge growth in the number of materials science submissions to JAP and APL over the last few years,” says Mark Cassar, AIP publisher. “These new journals will be important additions to the existing body of research publications and will respond to the needs of researchers. They will not only expand AIP’s already well-known and trusted sources of high-quality research information but they will also help authors to share their findings and get the exposure and recognition their works deserve.”

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